ACM Research Delivers Advanced Ultra Lith BK Photoresist Hardening Tool with Industry-Leading UV Curing and Temperature Uniformity
ACM Research (NASDAQ: ACMR) delivered its first Ultra Lith BK system to a leading global display panel manufacturer on Nov 19, 2025.
The tool targets advanced lithography challenges—process non‑uniformity, thermal drift, and CD variation—by offering ±5% UV intensity uniformity, precision temperature control, and multiple exposure modes (line‑scan, rotary, hybrid) to improve yield, pattern fidelity, and scalability for shrinking device geometries.
ACM Research ( NASDAQ: ACMR ) ha consegnato il suo primo sistema Ultra Lith BK a un importante produttore globale di pannelli display il 19 novembre 2025.
Lo strumento affronta le sfide della lithografia avanzata—non uniformità del processo, deriva termica e variazione del CD—offrendo uniformità dell'intensità UV ±5%, controllo preciso della temperatura e diverse modalità di esposizione (line-scan, rotary, hybrid) per migliorare la resa, la fedeltà del pattern e la scalabilità per geometrie di dispositivo sempre più piccole.
ACM Research (NASDAQ: ACMR) entregó su primer sistema Ultra Lith BK a un importante fabricante global de paneles de visualización el 19 de noviembre de 2025.
La herramienta aborda los desafíos de la litografía avanzada—no uniformidad del proceso, deriva térmica y variación del CD—ofreciendo uniformidad de intensidad UV de ±5%, control de temperatura de precisión y múltiples modos de exposición (línea de escaneo, rotativo, híbrido) para mejorar el rendimiento, la fidelidad del patrón y la escalabilidad para geometrías de dispositivos cada vez más pequeñas.
ACM Research (NASDAQ: ACMR)은 2025년 11월 19일 세계적 디스플레이 패널 제조업체에 첫 번째 Ultra Lith BK 시스템을 전달했습니다.
이 도구는 공정 비균일성, 열 드리프트 및 CD 편차와 같은 첨단 리소그래피 문제를 해결하기 위해 ±5% UV 강도 균일성, 정밀한 온도 제어, 그리고 노출 모드 다중(라인-스캔, 로터리, 하이브리드)을 제공하여 수율, 패턴 정확도, 소형화되는 소자 기하학에 따른 확장성을 개선합니다.
ACM Research (NASDAQ : ACMR) a livré son premier système Ultra Lith BK à un grand fabricant mondial de panneaux d'affichage le 19 novembre 2025.
Cet outil s’attaque aux défis de la lithographie avancée—inégalité du procédé, dérive thermique et variation de CD—en offrant une uniformité de l’intensité UV de ±5%, un contrôle précis de la température et plusieurs modes d’exposition (ligne-scan, rotatif, hybride) pour améliorer le rendement, la fidélité du motif et l’évolutivité pour des géométries de dispositifs en réduction.
ACM Research (NASDAQ: ACMR) lieferte am 19. November 2025 sein erstes Ultra Lith BK-System an einen führenden globalen Hersteller von Display-Panels.
Das Werkzeug zielt auf fortschrittliche Lithografie-Herausforderungen ab – Prozessinhomogenität, thermische Drift und CD-Variation – und bietet ±5% UV-Intensitätsuniformität, präzise Temperatursteuerung und mehrere Belichtungsmodi (Linienscan, Rotations-, Hybridmodus), um Ausbeute, Pattern-Fidelity und Skalierbarkeit für schrumpfende Geräte-Geometrien zu verbessern.
ACM Research (المُدرجة في ناسداك: ACMR) قد سلمت أول نظام Ultra Lith BK إلى مصنع رائد عالمي لصناعة لوحات العرض في 19 نوفمبر 2025.
يستهدف الجهاز تحديات الطباعة الحجرية المتقدمة—عدم تجانس العملية، الانزياح الحراري، وتفاوت CD—من خلال تقديم اتساق شدة UV ±5%، تحكم دقيق في الحرارة، وعدة أوضاع تعريض (خط-فحص، دوّار، هجين) لتحسين العائد، دقة النمط، وقابلية التوسع للهندسات الصغيرة للأجهزة.
- UV intensity uniformity of ±5%
- First Ultra Lith BK delivered to a global display panel manufacturer
- Supports line‑scan, rotary, and hybrid UV exposure modes
- Precision temperature control to reduce CD variation and overlay error
- Marks entry into display panel customer segment
- None.
Insights
ACM delivered an advanced lithography hardening tool to a leading display panel maker, marking entry into display customers and initial Track-series deployment.
The delivery of the Ultra Lith BK shows the company moved from demonstration to customer deployment on
Outcomes depend on customer validation in production and repeatable field performance; successful scale requires sustained uptime, service support, and continued matching of specs to customer process windows. Watch for customer-run qualification results, subsequent orders, and any published throughput or uptime metrics over the next 3–12 months to confirm commercial traction.
Ultra Lith BK delivers exceptional uniformity and flexible processing capabilities to enhance process stability, yield, and scalability in advanced lithography
MUNICH, Nov. 19, 2025 (GLOBE NEWSWIRE) -- SEMICON EUROPA – ACM Research, Inc. (“ACM”) (NASDAQ: ACMR), a leading supplier of wafer and panel processing solutions for semiconductor and advanced packaging applications, today announced the delivery of its first Ultra Lith Baker (“Ultra Lith BK”) system to a leading global display panel manufacturer. The system is engineered to address industry-wide challenges in advanced lithography, including process non-uniformity, thermal drift, and critical dimension (“CD”) variation. It can also help semiconductor manufacturers maintain stable yield and pattern fidelity as device geometries continue to shrink. With industry-leading ultraviolet (“UV”) curing uniformity and precision temperature control, the Ultra Lith BK enables highly stable and repeatable lithography processes.
The Ultra Lith BK’s UV curing system delivers ±
“As lithography continues to push the limits of precision, maintaining uniform process control is essential for consistent yield and device performance,” said Dr. David Wang, President and Chief Executive Officer of ACM. “The delivery of the Ultra Lith BK marks a key milestone as the first customer deployment of our Track series following earlier demonstration and validation. It also marks our entry into display panel customers, a new segment with high-volume mass-production capabilities and elevated expectations for equipment performance and stability. The Ultra Lith BK combines high uniformity with a configurable system architecture, and multiple exposure modes to help customers minimize variability and scale production for future technology nodes.”
About the Ultra Lith BK
The Ultra Lith BK integrates six cold plates delivering temperature uniformity of ±0.1°C. The system adopts a configurable design and can accommodate up to 32 hotplates and two UV curing systems, enabling customers to flexibly configure the tool according to different process recipes and photoresist integration requirements. Two types of hotplates are available:
- The high-flow hotplate achieves a maximum process temperature of 250°C with temperature uniformity ≤
0.2% . - The low-flow hotplate operates at temperatures up to 180°C with temperature uniformity ≤
0.08% , offering benchmark-level performance in the industry.
To learn more about the Ultra Lith BK platform, schedule a meeting with ACM at booth C1129 at SEMICON Europa, November 18-21, Messe München, or visit our website.
Forward-Looking Statements
Certain statements contained in this press release are not historical facts and may be forward-looking statements within the meaning of the Private Securities Litigation Reform Act of 1995. Words such as “plans,” “expects,” “believes,” “anticipates,” “designed,” and similar words are intended to identify forward-looking statements. Forward-looking statements are based on ACM management’s current expectations and beliefs and involve a number of risks and uncertainties that are difficult to predict and that could cause actual results to differ materially from those stated or implied by the forward-looking statements. A description of certain of these risks, uncertainties and other matters can be found in filings ACM makes with the U.S. Securities and Exchange Commission, all of which are available at www.sec.gov. Because forward-looking statements involve risks and uncertainties, actual results and events may differ materially from results and events currently expected by ACM. Readers are cautioned not to place undue reliance on these forward-looking statements, which speak only as of the date hereof. ACM undertakes no obligation to publicly update these forward-looking statements to reflect events or circumstances that occur after the date hereof or to reflect any change in its expectations with regard to these forward-looking statements or the occurrence of unanticipated events.
About ACM Research, Inc.
ACM develops, manufactures and sells semiconductor process equipment spanning cleaning, electroplating, stress-free polishing, vertical furnace processes, track, PECVD, and wafer- and panel-level packaging tools, enabling advanced and semi-critical semiconductor device manufacturing. ACM is committed to delivering customized, high-performance, cost-effective process solutions that semiconductor manufacturers can use in numerous manufacturing steps to improve productivity and product yield. For more information, visit www.acmr.com.
© ACM Research, Inc. Ultra Lith and the ACM Research logo are trademarks of ACM Research, Inc. For convenience, these trademarks appear in this press release without ™ symbols, but that practice does not mean ACM will not assert, to the fullest extent under applicable law, its rights to such trademarks. All other trademarks are the property of their respective owners.
| Media Contact: | Company Contacts: |
| Alyssa Lundeen | USA |
| Kiterocket | Robert Metter |
| +1 218.398.0776 | +1 503.367.9753 |
| alundeen@kiterocket.com | |
| China | |
| IR Contacts: | Xi Wang |
| The Blueshirt Group | ACM Research (Shanghai), Inc. |
| Steven C. Pelayo, CFA | +86 21 50808868 |
| +1 (360) 808-5154 | |
| steven@blueshirtgroup.co | Korea |
| ACM Research (Korea), Inc. | |
| Gary Dvorchak, CFA | +82 70-41006699 |
| +86 (138) 1079-1480 | |
| gary@blueshirtgroup.co | Taiwan |
| David Chang | |
| +886 921999884 | |
| Singapore | |
| Adrian Ong | |
| +65 8813-1107 |
FAQ
What did ACMR announce on Nov 19, 2025 about the Ultra Lith BK delivery?
What is the reported UV curing uniformity for ACMR's Ultra Lith BK (ACMR)?
How does the Ultra Lith BK (ACMR) aim to improve yield and pattern fidelity?
Which exposure modes does ACMR's Ultra Lith BK support for lithography processing?
Does the Ultra Lith BK delivery represent a new market for ACMR (ACMR)?
