Samsung Electronics and ASML Expand Strategic Collaboration for Next-Generation Semiconductor Manufacturing

ASML deepens its long-standing partnership with Samsung as the chipmaker plans High NA EUV adoption in DRAM mass production by 2028.

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• Samsung joins industry initiative for 12-inch photomask platform for High NA EUV
• Samsung reinforces leadership with planned High NA EUV adoption for future DRAM manufacturing for the first time in the industry

SEOUL, Korea & VELDHOVEN, Netherlands--(BUSINESS WIRE)-- Samsung Electronics and ASML today announced an expansion of their long-standing strategic partnership, deepening collaboration on High NA EUV lithography and advanced semiconductor manufacturing technologies that will help drive the next generation of innovation in the AI era.

Building on years of successful cooperation, the companies will work together to accelerate the development and deployment of technologies that support the increasing performance and efficiency requirements of advanced semiconductor manufacturing.

Samsung will join the industry initiative to advance next-generation 12-inch photomask technology for future manufacturing. The semiconductor industry has relied on the 6-inch photomask format for decades. With High NA EUV, the transition to larger, 12-inch masks is expected to further increase fab productivity, lower chipmaking costs and remove stitching constraints. It will enable advanced chip manufacturers to fully leverage the advantages of High NA EUV, making future generations of leading-edge chips more cost-effective.

Drawing on its leadership in both memory and foundry manufacturing, as well as its extensive experience with advanced EUV lithography, Samsung is positioned to play a critical role in the 12-inch photomask transition. The company will work closely with industry partners to develop the required mask technologies and supporting infrastructure.

Samsung also plans to introduce ASML’s High NA extreme ultraviolet (EUV) lithography into future DRAM high-volume manufacturing for the first time in the industry by 2028, further demonstrating the readiness of High NA technology to support advanced memory and logic applications. High NA EUV is expected to extend the DRAM scaling roadmap, with improved resolution enabling process simplification and increased efficiency.

The announcement reflects a shared commitment to innovation, technology leadership and long-term partnership. Samsung and ASML expect to continue exploring opportunities for collaboration in areas including advanced memory and innovative manufacturing approaches.

Young Hyun Jun, Vice Chairman & CEO, Samsung Electronics said: "The AI era is transforming the semiconductor industry and increasing the importance of technological innovation across the entire value chain. Samsung is committed to maintaining leadership in advanced semiconductor manufacturing, including memory and foundry, through breakthrough technologies and strong partnerships. By further strengthening our collaboration with ASML, we are helping lay the foundation for the next generation of AI and semiconductor innovation."

Christophe Fouquet, President and Chief Executive Officer, ASML said: "Samsung has been one of ASML's most important innovation partners for many years. Together, we have helped advance the technologies that underpin modern semiconductor manufacturing. As the industry enters a new era driven by artificial intelligence, close collaboration with our customers becomes even more important. We look forward to working with Samsung to enable the next wave of semiconductor innovation."

About Samsung Electronics Co., Ltd.

Samsung inspires the world and shapes the future with transformative ideas and technologies. The company is redefining the worlds of TVs, digital signage, smartphones, wearables, tablets, home appliances and network systems, as well as memory, system LSI and foundry. Samsung is also advancing medical imaging technologies, HVAC solutions and robotics, while creating innovative automotive and audio products through Harman. With its SmartThings ecosystem, open collaboration with partners, and integration of AI across its portfolio, Samsung delivers a seamless and intelligent connected experience. For the latest news, please visit the Samsung Newsroom at news.samsung.com.

About ASML Holding N.V.

ASML is a leading supplier to the semiconductor industry. The company provides chipmakers with hardware, software and services to mass produce the patterns of integrated circuits (microchips). Together with its partners, ASML drives the advancement of more affordable, more powerful, more energy-efficient microchips. ASML enables groundbreaking technology to solve some of humanity's toughest challenges, such as in healthcare, energy use and conservation, mobility and agriculture. ASML is a multinational company headquartered in Veldhoven, the Netherlands, with offices across EMEA, the US and Asia. Every day, ASML’s more than 44,000 employees (FTE) challenge the status quo and push technology to new limits. ASML is traded on Euronext Amsterdam and NASDAQ under the symbol ASML. Discover ASML – our products, technology and career opportunities – at www.asml.com.

View source version on businesswire.com: https://www.businesswire.com/news/home/20260908737893/en/

Ujeong Jahnke
Samsung Semiconductor Europe GmbH
Tel. +49(0)89-45578-1000
Email: sseg.comm@samsung.com

Source: Samsung Electronics Co., Ltd.

Key Terms

high na euv technical

A high NA EUV is an advanced version of extreme ultraviolet (EUV) lithography used to etch microscopic patterns on semiconductor wafers; “high NA” means a larger numerical aperture lens that lets light resolve finer details. Think of it like upgrading from a camera lens that captures general shapes to one that captures much finer detail—this enables smaller, denser, and more complex chips. Investors care because it influences chipmakers' ability to follow Moore’s Law, affects production costs, equipment spending, and competitive positioning across the semiconductor supply chain.

photomask technical

A photomask is a precise glass or quartz plate that acts like a stencil to project microscopic circuit patterns onto silicon wafers during semiconductor manufacturing. It matters to investors because photomasks are critical to making advanced chips—errors or shortages can slow production, raise costs, and affect yields, so demand and quality of photomasks influence equipment suppliers, chipmakers’ profitability, and the broader semiconductor supply chain.

lithography technical

Lithography is the manufacturing step that ‘prints’ the tiny circuit patterns onto semiconductor wafers using light and specialized stencils, like using a projector and mask to draw a microscopic blueprint. It determines how small, fast, and power-efficient chips can be made, so changes in lithography technology or capacity directly affect production costs, product performance, and which suppliers and manufacturers gain or lose competitive advantage — key concerns for investors.

dram technical

A dram is a small, traditional unit used to measure either mass or liquid volume in manufacturing and pharmaceuticals — roughly 1.77 grams for a weight dram or about 3.7 milliliters for a fluid dram, similar to a small teaspoon or a couple of drops. Investors care because dram-based measurements affect drug dosing, packaging sizes, labeling compliance and raw-material usage, which in turn influence production costs, inventory counts and regulatory risk.