Samsung Electronics and Nova Jointly awarded the Vladimir Ukraintsev Award at the SPIE Advanced Lithography conference
Rhea-AI Summary
Nova (Nasdaq: NVMI) and Samsung Electronics have been jointly awarded the Vladimir Ukraintsev Award for 'Collaborations in Metrology' at SPIE's 2024 Advanced Lithography + Patterning Conference. The recognition comes for their co-authored paper on chalcogenide alloy layer monitoring using advanced technologies.
The award-winning research demonstrates a novel approach to monitoring the thickness of chalcogenide Ovonic Threshold Switching (OTS) layer, a critical parameter in Selector-Only Memory (SOM) process control. The solution combines Spectral Interferometry, Raman Spectroscopy, and Machine Learning algorithms to achieve precise monitoring and control of the chalcogenide layer.
Dr. Shay Wolfling, Nova's Chief Technology Officer, highlighted how this collaboration demonstrates Nova's ability to leverage innovative technologies for advanced semiconductor device process control.
Positive
- Recognition of Nova's technological leadership through prestigious industry award
- Strategic collaboration with Samsung Electronics, a major industry player
- Successful development of innovative metrology solution for advanced semiconductor manufacturing
Negative
- None.
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On the day this news was published, NVMI declined 3.89%, reflecting a moderate negative market reaction.
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REHOVOT,

The award was granted to Nova and Samsung on the opening day of the 2025 conference. The paper is a result of continuous collaboration between the companies to explore innovative approaches to metrology in advanced chip manufacturing. The paper demonstrates the application of Nova's novel technologies in advanced process control by utilizing its unique and differentiated solutions.
The thickness of the chalcogenide Ovonic Threshold Switching (OTS) layer is one of the most critical parameters for the Selector-Only Memory (SOM) process control. In this work, we successfully demonstrated an alternative approach to enable precise monitoring and control of the chalcogenide layer using hybrid metrology consisting of Spectral Interferometry, Raman Spectroscopy and Machine Learning algorithms. The paper details how these advanced techniques were applied to achieve accurate thickness monitoring, ensuring optimal performance and reliability of SOM devices.
"We are honored to receive this prestigious award in collaboration with Samsung Electronics," said Dr. Shay Wolfling, Chief Technology Officer of Nova. "This collaboration showcases Nova's capability to leverage its unique innovative technologies, facilitating process control in the most advanced semiconductor devices. We continue to expand our solutions and enhance synergies within our portfolio, in collaboration with our leading customers, to address the growing challenges in advanced node manufacturing."
About Nova
Nova is a leading innovator and key provider of material, optical and chemical metrology solutions for advanced process control in semiconductor manufacturing. Nova delivers continuous innovation by providing state-of-the-art, high-performance metrology solutions for effective process control throughout the semiconductor fabrication lifecycle. Nova's product portfolio, which combines high-precision hardware and cutting-edge software, provides its customers with deep insight into developing and producing the most advanced semiconductor devices. Nova's unique capability to deliver innovative solutions enables its customers to improve performance, enhance product yields, and accelerate time to market. Nova acts as a partner to semiconductor manufacturers from its offices worldwide. Additional information may be found on Nova's website link - https://www.novami.com/.
Nova is traded on the Nasdaq and TASE, Nasdaq ticker symbol NVMI.
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SOURCE Nova