Photronics Extends Capability with the First Installation of a Merchant Multi-beam Mask Writer in the United States

Rhea-AI Summary

Photronics (Nasdaq: PLAB) has announced the installation of the first merchant multi-beam mask writer in the United States at their Boise, Idaho facility. This technological advancement marks a significant milestone in photomask production capabilities.

The new multi-beam tool features a parallel writing engine that delivers enhanced speed and performance for U.S.-built merchant photomask products. The technology enables the production of complex IC mask shapes, particularly for critical curvilinear designs, and can write the finest resolution EUV and nanoimprint masks.

The installation strengthens Photronics' position as the only U.S.-based high-end mask merchant facility, supporting both U.S. Government Trusted and commercial advanced photomask applications.

Positive

• First merchant multi-beam mask writer installation in the U.S., establishing technological leadership
• Enhanced capability for complex IC mask shapes and critical curvilinear designs
• Improved production speed and performance through parallel writing engine
• Ability to support most advanced U.S. photomask needs with EUV and nanoimprint mask capabilities

Negative

• None.

News Market Reaction

+2.17%

1 alert

+2.17% News Effect

On the day this news was published, PLAB gained 2.17%, reflecting a moderate positive market reaction.

Data tracked by StockTitan Argus on the day of publication.

BROOKFIELD, Conn., Aug. 08, 2025 (GLOBE NEWSWIRE) -- Photronics, Inc. (Nasdaq: PLAB), a worldwide leader in photomask technologies and solutions, announced the installation of a new multi-beam tool in its facility in Boise, Idaho expanding Photronics technological leadership.

“This installation marks the first multi-beam writer in production for the merchant market in the U.S. extending Photronics leadership in support of U.S. Government Trusted and commercial advanced photomask applications in the U.S. and globally,” said CEO George Macricostas. “The multibeam tool leverages a massively parallel writing engine to deliver unprecedented speed and performance for U.S. built merchant photomask products. We look forward to collaborating with our customers to deploy this capability to improve their time to market and end-product IC performance. Photronics continues to build on our U.S. based flagship IC technology center to enhance capabilities of the only U.S. based high end mask merchant facility.”

Added CTO Chris Progler, “In addition to writing speed, the multi-beam platform enables highly complex IC mask shapes to be written such as those found in critical curvilinear style designs. By enabling production of these new IC design forms, it creates opportunities for our U.S. and global customers to deliver higher performing IC products faster. This multibeam system is also capable to write the finest resolution EUV and nanoimprint masks allowing Photronics to directly support the most advanced U.S. photomask masks needs from our U.S. based technology center. We are engaged with multiple customers now to pilot and qualify this unique U.S. merchant capability.”   

About Photronics

Photronics is a leading worldwide manufacturer of integrated circuit (IC) and flat panel display (FPD) photomasks. High precision quartz plates that contain microscopic images of electronic circuits, photomasks are a key element in the IC and FPD manufacturing process. Founded in 1969, Photronics has been a trusted photomask supplier for over 56 years. The company operates 11 strategically located manufacturing facilities in Asia, Europe, and North America. Additional information can be accessed at www.photronics.com.

For Further Information:
Ted Moreau
VP, Investor Relations
469.395.8175
tmoreau@photronics.com

FAQ

What new technology did Photronics (PLAB) install in its Boise facility?

Photronics installed the first merchant multi-beam mask writer in the United States, featuring a parallel writing engine for advanced photomask production.

How does the new multi-beam tool benefit Photronics' customers?

The tool enables faster time to market, improved IC performance, and production of complex IC mask shapes for critical curvilinear designs, helping customers deliver higher-performing IC products more quickly.

What capabilities does the new multi-beam mask writer provide to Photronics?

The tool provides unprecedented writing speed, ability to create complex IC mask shapes, and can write the finest resolution EUV and nanoimprint masks for advanced applications.

Why is Photronics' multi-beam installation significant for the U.S. market?

It's the first merchant multi-beam writer in production in the U.S., strengthening Photronics' position as the only U.S.-based high-end mask merchant facility supporting both government and commercial applications.

What types of applications will Photronics support with the new multi-beam technology?

The technology will support U.S. Government Trusted applications, commercial advanced photomask applications, and the most advanced U.S. photomask needs through EUV and nanoimprint mask capabilities.