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DuPont Wins Three 2025 R&D 100 Awards

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DuPont (NYSE:DD) has secured three prestigious 2025 R&D 100 Awards in the Mechanical/Materials category, recognizing the company's most innovative technologies. The winning innovations include: Tychem® 6000 SFR, a chemical-protective garment offering 30-minute protection against over 250 chemicals; FilmTec™ Fortilife™ XC160 Membrane, an advanced reverse osmosis solution for sustainable water treatment; and UV™ 26GNF Photoresist, a non-fluorine alternative for semiconductor fabrication.

These awards, known as the "Oscars of Innovation," received entries from 13 countries and were evaluated by 54 industry professionals, highlighting DuPont's commitment to developing customer-focused solutions for global challenges.

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  • Recognition of three innovative technologies in prestigious R&D 100 Awards
  • Tychem® 6000 SFR provides protection against 250+ chemicals with flash fire safety features
  • FilmTec™ membrane enables reduced energy consumption and operational costs
  • UV™ 26GNF Photoresist advances sustainability in semiconductor manufacturing

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WILMINGTON, Del., Aug. 21, 2025 /PRNewswire/ -- DuPont (NYSE: DD) today announced that it has won three 2025 R&D 100 Awards in the Mechanical/Materials category. The R&D 100 Awards, sponsored by R&D World Magazine, recognizes the 100 most innovative technologies of the previous year.

"We're honored that three of our innovative technologies have been recognized for their game-changing impacts and delivering exceptional performance and value for our customers," said Alexa Dembek, DuPont Chief Technology and Sustainability Officer. "I'm so proud of the dedication and commitment our teams display every day to translate cutting-edge thinking into customer-led solutions that help address some of the world's most pressing challenges."

The following are DuPont's 2025 R&D 100 Award-winning products and innovations:

DuPont™ Tychem® 6000 SFRDesigned to be worn over primary flame-resistant protective clothing, Tychem® 6000 SFR garments help provide industrial workers and hazmat responders with permeation protection against a range of chemicals while providing escape time from flash fires. Tychem® 6000 SFR fabric provides at least 30 minutes of protection for more than 250 chemical challenges including chemical warfare agents, toxic industrial chemicals, and flammable organic solvents. Unlike traditional chemical protective clothing, in the event that a flash fire occurs, Tychem® 6000 SFR garments won't contribute to additional burn injury if appropriate primary flame-resistant personal protective equipment is worn beneath.

FilmTec™ Fortilife™ XC160 Membrane – The FilmTec™ Fortilife™ XC160 Membrane is a reverse osmosis element designed to concentrate wastewater streams, enabling a more efficient and sustainable approach to water reuse and wastewater treatment. It is ideal for applications requiring sustainable water reuse, such as in the chemical and petrochemical industries, steel and iron industries, power generation, pulp and paper production, and textiles, as well as lithium-ion battery production. With the ability to operate under ultra-high-pressure conditions, FilmTec™ Fortilife™ XC160 Membranes enable high water recovery to support industrial users facing stringent discharge regulations while reducing energy consumption, carbon emissions, and operational costs.

UV™ 26GNF Photoresist – UV™ 26GNF Photoresist is a breakthrough achievement in advancing sustainability in semiconductor fabrication. This commercial technology delivers precise control in lithographic patterning, a critical process in the production of integrated circuits. Through extensive research and development, leveraging computational modeling and digital tools to accelerate the design process, our team has pioneered the development of a photoresist that substitutes traditional fluorine-containing compounds with a non-fluorine alternative.

The R&D 100 Awards, now in its 63rd year, are widely recognized as the "Oscars of Innovation," as they identify and celebrate the top technology products and services of the year. This year, the R&D 100 Awards received entries from 13 different countries and regions and nominations were judged by 54 well-respected industry professionals from across the world.

About DuPont
DuPont (NYSE: DD) is a global innovation leader with technology-based materials and solutions that help transform industries and everyday life. Our employees apply diverse science and expertise to help customers advance their best ideas and deliver essential innovations in key markets including electronics, transportation, construction, water, healthcare and worker safety. More information about the company, its businesses and solutions can be found at www.dupont.com. Investors can access information included on the Investor Relations section of the website at investors.dupont.com.

DuPont™, the DuPont Oval Logo, and all trademarks and service marks denoted with ™, SM or ® are owned by affiliates of DuPont de Nemours, Inc. unless otherwise noted.

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SOURCE DuPont

FAQ

What awards did DuPont (DD) win in 2025?

DuPont won three 2025 R&D 100 Awards in the Mechanical/Materials category for Tychem® 6000 SFR, FilmTec™ Fortilife™ XC160 Membrane, and UV™ 26GNF Photoresist technologies.

What is DuPont's Tychem® 6000 SFR and how does it protect workers?

Tychem® 6000 SFR is a protective garment that provides 30 minutes of protection against over 250 chemicals while offering escape time from flash fires, without contributing to burn injury when worn over flame-resistant clothing.

How does DuPont's FilmTec™ Fortilife™ XC160 Membrane benefit industrial users?

The membrane enables high water recovery in industrial wastewater treatment, reducing energy consumption, carbon emissions, and operational costs while helping users meet discharge regulations.

What makes DuPont's UV™ 26GNF Photoresist innovative for semiconductor manufacturing?

UV™ 26GNF Photoresist is innovative because it replaces traditional fluorine-containing compounds with a non-fluorine alternative, advancing sustainability in semiconductor fabrication while maintaining precise lithographic patterning control.