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Applied Materials Partners with SCREEN To Bring Advanced Wafer Cleaning Technologies to EPIC Center

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Applied Materials (Nasdaq: AMAT) and SCREEN Semiconductor Solutions formed a new collaboration at Applied’s upcoming EPIC Center in Silicon Valley. The partners will co-develop co-optimized wafer cleaning and materials engineering process solutions to improve yields, performance and time-to-production for next-generation chips at advanced process nodes.

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AI-generated analysis. Not financial advice.

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Key Figures

Current Price: $432.51 52-week Range: $153.47–$448.45 EPIC Center Size: 180,000 square feet +5 more
8 metrics
Current Price $432.51 Pre-news trading level on publication date
52-week Range $153.47–$448.45 52-week low and high before this news
EPIC Center Size 180,000 square feet EPIC Center facility on Applied’s Silicon Valley campus
Q2 FY2026 Revenue $7.91 billion Record quarterly revenue reported May 14, 2026
Q2 FY2026 GAAP EPS $3.51 Record EPS from Q2 FY2026 results
Quarterly Net Income $2.8 billion Net income for quarter ended April 26, 2026 (10-Q)
Cash & Investments $13.4 billion Period-end cash, cash equivalents and investments (10-Q)
EPIC Capex Plan $5 billion Planned EPIC Center capital spend mentioned in prior AI partnership

Market Reality Check

Price: $432.51 Vol: Volume 3,418,736 is below...
low vol
$432.51 Last Close
Volume Volume 3,418,736 is below the 7,737,422 share 20-day average, suggesting a quieter session. low
Technical Price at 432.51 is trading above the 200-day MA of 287.24, reflecting a firmly established uptrend.

Peers on Argus

AMAT gained 1.12% while key peers were mixed: LRCX (-0.12%), KLAC (0.86%), TER (...
1 Down

AMAT gained 1.12% while key peers were mixed: LRCX (-0.12%), KLAC (0.86%), TER (0.97%), ENTG (2.33%), ASML (0.82%). Momentum scanner flagged only CAMT (-1.11%), indicating this move is more stock-specific than sector-driven.

Historical Context

5 past events · Latest: May 20 (Positive)
Pattern 5 events
Date Event Sentiment Move Catalyst
May 20 EPIC partner addition Positive +4.4% Broadcom joined EPIC platform to advance AI chip packaging collaborations.
May 14 Earnings results Positive -0.9% Record Q2 FY2026 revenue, EPS and guidance alongside new partnerships.
May 11 EPIC university partners Positive -2.8% ASU, RPI and Stanford joined EPIC Center as inaugural research partners.
May 11 AI collaboration Positive +1.9% TSMC partnership at EPIC Center targeting next-gen AI semiconductor scaling.
May 06 Investor conferences Neutral +4.3% Management participation in several major investor conferences with webcasts.
Pattern Detected

Recent EPIC-related partnerships and strong earnings have often been followed by meaningful but mixed price reactions, with both rallies and pullbacks around otherwise positive news.

Recent Company History

In the last month, AMAT has repeatedly highlighted its EPIC Center strategy. Earlier in May 2026, partnerships with TSMC and universities, plus Broadcom’s addition as an EPIC partner, underscored a focus on AI and advanced packaging. Record Q2 FY2026 results on May 14 featured revenue of $7.91B and strong margins, yet saw a modest negative reaction. Today’s SCREEN collaboration continues the theme of expanding EPIC’s ecosystem, deepening co-optimized process development for next-generation chips.

Market Pulse Summary

This announcement deepens Applied Materials’ EPIC Center strategy by adding SCREEN’s cleaning, wet e...
Analysis

This announcement deepens Applied Materials’ EPIC Center strategy by adding SCREEN’s cleaning, wet etch and surface preparation technologies to its deposition and etch portfolio. The collaboration targets higher yields and faster commercialization for next-generation chips in a 180,000-square-foot Silicon Valley facility due to be operational in 2026. Set against recent record Q2 FY2026 results and multiple EPIC partnerships, investors may track how these R&D alliances translate into tool adoption, revenue growth and sustained margins over time.

Key Terms

deposition, etch, ion implantation, semiconductor devices, +1 more
5 terms
deposition technical
"Any defects introduced during deposition, etch, and materials modification steps"
A deposition is a formal, recorded interview of a witness or party conducted outside of court where a lawyer asks questions and the answers are given under oath and transcribed. For investors, depositions matter because they can reveal detailed factual admissions, internal practices, or risks that may affect a company’s finances or reputation — think of it as a taped, on-the-record conversation that can later be used as evidence and influence legal outcomes or market confidence.
etch technical
"Any defects introduced during deposition, etch, and materials modification steps"
Etch is a manufacturing process that removes material from a surface to create patterns, shapes or features—commonly done with chemicals, gases or light-based methods. Think of it like carefully carving a design into a metal plate: in chips, displays, or medical devices the process defines tiny structures that determine performance, yield and reliability. For investors, etching affects production cost, product quality and supply capacity, so improvements or problems in etch can change a maker’s competitiveness and margins.
ion implantation technical
"support pre- and post-process cleaning optimization across film formation, etch, and ion implantation workflows"
A manufacturing process that shoots tiny charged atoms into a solid material to change its electrical properties, most commonly used when making computer chips. Think of it like spraying microscopic seeds into a surface so parts of a circuit will conduct electricity differently; it directly affects product performance, production yield and cost. Investors watch it because advances or bottlenecks in this step can influence a maker’s competitiveness, output and profit margins.
semiconductor devices technical
"As semiconductor devices have become increasingly complex, precise wafer surface"
Semiconductor devices are tiny electronic components made from materials that can control the flow of electricity, allowing them to switch, amplify or process electrical signals inside gadgets and systems. Investors care because these components are the building blocks of computing, communications and many modern products—demand, supply constraints, production capacity and technological advances directly affect company revenues, profit margins and industry competitiveness, much like engines determine how well different cars perform.
single-wafer cleaning systems technical
"SCREEN SPE's single-wafer cleaning systems have been deployed to support"
Single-wafer cleaning systems are specialized machines used in semiconductor manufacturing to wash and remove particles, residues and films from individual silicon wafers between processing steps. Like washing a single delicate plate by hand rather than a whole rack, they give tighter control over contamination and uniformity, which directly affects chip yield, performance and manufacturing costs—key factors investors watch when assessing equipment demand, production capacity and profit margins in the semiconductor supply chain.

AI-generated analysis. Not financial advice.

  • Collaborative R&D at Applied’s EPIC Center in Silicon Valley will enable higher yields and faster commercialization of next-generation chips
  • Partnership deepens long-standing joint development relationship to overcome process challenges in leading-edge chipmaking

SANTA CLARA, Calif., May 26, 2026 (GLOBE NEWSWIRE) -- Applied Materials, Inc. (Nasdaq: AMAT), the leader in materials engineering solutions for the semiconductor industry, today announced that SCREEN Semiconductor Solutions Co., Ltd. (SCREEN SPE), a group company of SCREEN Holdings Co., Ltd. (TSE: 7735), has joined the EPIC Center as its newest innovation partner. The collaboration will bring together SCREEN SPE’s expertise in wafer cleaning technology with Applied's leadership in materials engineering to develop co-optimized process solutions for the world’s most advanced chips.

As semiconductor devices have become increasingly complex, precise wafer surface cleanliness has become a critical enabler of yield, device performance, and reliability at the most advanced process nodes. Any defects introduced during deposition, etch, and materials modification steps must be addressed with ever-greater precision, making co-optimized cleaning solutions an essential component of developing next-generation materials engineering technologies.

By combining Applied's deep process expertise across deposition, dry etch and materials modification with SCREEN SPE’s industry-leading cleaning, wet etch and surface preparation capabilities, the two companies can develop co-optimized, end-to-end process solutions that help chipmakers achieve higher yields and faster time-to-production on next-generation devices.

“The EPIC Center is designed to dramatically accelerate the commercialization of next-generation semiconductor technologies by co-locating and co-innovating with customers and partners across the entire semiconductor ecosystem,” said Dr. Prabu Raja, President of the Semiconductor Products Group at Applied Materials. “SCREEN SPE’s wet etch and surface preparation capabilities are deeply intertwined with virtually every process step in chip manufacturing. By bringing our technologies together at the EPIC Center, we can develop co-optimized process solutions that address the increasingly complex surface engineering challenges our customers face as they push to the next technology frontier.”

“SCREEN SPE and Applied Materials share a long history of technical collaboration, and we are proud to deepen that partnership at Applied’s new EPIC Center in Silicon Valley,” said Akihiko Okamoto, President of SCREEN Semiconductor Solutions Co., Ltd. “As device structures become more intricate and process windows narrow, the interface between wet etch and cleaning technology and adjacent process steps has never been more important. The deployment of our cleaning, wet etch and surface preparation technologies at Applied’s EPIC Center enables the evaluation of process-optimized solutions across the full process flow, supporting higher performance and greater reliability for our customers’ most advanced devices.”

The new partnership builds on a collaborative relationship that includes joint process development work at Applied's Materials Engineering Technology Accelerator (META) Center in Albany, New York, where SCREEN SPE's single-wafer cleaning systems have been deployed to support pre- and post-process cleaning optimization across film formation, etch, and ion implantation workflows. The new EPIC Center collaboration significantly expands the scope and scale of this relationship, enabling the companies’ engineering teams to work in proximity on a broader range of next-generation process challenges with faster cycles of learning and more direct integration into Applied's R&D programs.

Applied's new EPIC (Equipment and Process Innovation and Commercialization) Center in Silicon Valley represents the largest-ever U.S. investment in advanced semiconductor equipment R&D. Spanning more than 180,000 square feet on Applied's Silicon Valley campus, the center is designed from the ground up to dramatically reduce the time it takes to commercialize breakthrough technologies — compressing the journey from early-stage research to full-scale manufacturing by as much as half. The EPIC Center serves as a collaborative hub where leading chipmakers, equipment and materials suppliers, and research institutions work alongside Applied's teams to accelerate the development of next-generation semiconductor technologies. The facility is on track to become operational in 2026.

Forward-Looking Statements
This press release contains forward-looking statements, including those regarding Applied's investment and growth strategies, the development of new materials and technologies, industry outlook and technology requirements, the plans and expectations for the EPIC Center, and other statements that are not historical facts. These statements and their underlying assumptions are subject to risks and uncertainties and are not guarantees of future performance. Factors that could cause actual results to differ materially from those expressed or implied by such statements include, without limitation: the demand for semiconductors and customers' technology requirements; the ability to develop new and innovative technologies; the ability to obtain and protect intellectual property rights in key technologies; the ability to achieve the objectives of the EPIC Center; and other risks and uncertainties described in Applied's filings with the Securities and Exchange Commission, including Applied's most recent Forms 10-K, 10-Q and 8-K. All forward-looking statements are based on management's current estimates, projections and assumptions, and Applied assumes no obligation to update them.

About Applied Materials
Applied Materials, Inc. (Nasdaq: AMAT) is the leader in materials engineering solutions that are at the foundation of virtually every new semiconductor and advanced display in the world. The technology we create is essential to advancing AI and accelerating the commercialization of next-generation chips. At Applied, we push the boundaries of science and engineering to deliver material innovation that changes the world. Learn more at www.appliedmaterials.com.

About SCREEN SPE
SCREEN Semiconductor Solutions Co., Ltd. is a leading manufacturer of wafer processing equipment for the global semiconductor market. SCREEN consistently holds the No.1 global share* in wafer cleaning equipment and provides a broad range of solutions that support semiconductor manufacturing, including lithography, annealing, and measurement/inspection systems. Learn more at https://www.screen.co.jp/spe/en.
* Based on SCREEN in-house research

Contacts:
Applied Materials
Ricky Gradwohl (editorial/media) 408.235.4676
Mike Sullivan (financial community) 408.986.7977


FAQ

What did Applied Materials (AMAT) announce about its partnership with SCREEN at the EPIC Center?

Applied Materials announced that SCREEN Semiconductor Solutions joined its EPIC Center as an innovation partner to co-develop wafer cleaning and materials engineering processes. According to Applied Materials, the collaboration targets higher yields and faster commercialization of next-generation semiconductor devices.

How will the Applied Materials (AMAT) and SCREEN partnership at the EPIC Center benefit chipmakers?

The partnership aims to deliver co-optimized, end-to-end process solutions that help chipmakers raise yields and shorten time-to-production. According to Applied Materials, combining deposition, etch and cleaning expertise targets complex surface engineering challenges at leading-edge semiconductor nodes.

What role does the EPIC Center play in Applied Materials (AMAT) semiconductor R&D strategy?

The EPIC Center is designed as a collaborative R&D hub to speed commercialization of new semiconductor equipment technologies. According to Applied Materials, the Silicon Valley facility seeks to cut time from early research to manufacturing by up to half and become operational in 2026.

How does the new EPIC Center collaboration expand Applied Materials (AMAT) and SCREEN’s existing work?

The EPIC Center partnership builds on joint development at Applied’s META Center in Albany, New York. According to Applied Materials, the new collaboration broadens process coverage and enables closer, faster engineering cycles across deposition, etch, ion implantation and cleaning workflows.

When is Applied Materials (AMAT) EPIC Center expected to become operational?

The EPIC Center in Silicon Valley is on track to become operational in 2026. According to Applied Materials, the facility spans more than 180,000 square feet and is described as its largest-ever U.S. investment in advanced semiconductor equipment R&D.

What technologies are Applied Materials (AMAT) and SCREEN focusing on in their EPIC Center collaboration?

The collaboration focuses on wafer cleaning, wet etch, surface preparation and adjacent process steps like deposition and dry etch. According to Applied Materials, co-optimizing these technologies is intended to enhance yield, reliability and performance of the most advanced semiconductor devices.